Showing 41 - 60 out of 111
Year: 2021
Unlock high-performance full-body motion capture with this Xsens MVN motion capture bundle—ideal for animators, filmmakers, VFX professionals, and researchers. This set includes: Xsens MVN Suit (optimized for real-time, inertial-based motion tracking) Xsens Gloves (precision finger tracking) Please note: This bundle is hardware only – no software license included. Perfect for buyers who already have an active license or access through …15,000 $
USA
Year: 1995
All specifications and information are subject to change without notice and could not be used for purchase and facility plan. Please check the updated information at our website before purchasing. Appreciate your time. Model: Gasonics Aura 2000LL Category: Plasma Asher, Semiconductor Process equipment Original Equipment Manufacturer: Gasonics Condition: Fully Refurbished and Tested by seller Valid Time: This item is only …Price on request
USA
Year: 1995
All specifications and information are subject to change without notice and could not be used for purchase and facility plan. Please check the updated information at our website before purchasing. Appreciate your time. Model: Heatpulse 4100 Category: RTP – Rapid Thermal Processing Original Equipment Manufacturer: AG Associates Condition:Fully Refurbished and Tested by seller Valid Time: This item is only for …Price on request
USA
Year: 1994
All specifications and information are subject to change without notice and could not be used for purchase and facility plan. Please check the updated information at our website before purchasing. Appreciate your time. Model: PlasmaTherm 790 Category: Plasma Etcher, Semiconductor Process equipment Original Equipment Manufacturer: PlasmaTherm Condition: Fully Refurbished and Tested by seller Valid Time: This item is only for …Price on request
USA
Year: 1987
Model or Part Number:Branson/IPC 3000 Description: Plasma Asher Condition: Complete, working with OEM specifications. Price Term: EX-WORKS. Buyer is responsible for shipping. Customer is responsible for any tax if applicable. Lead time: 6-8 weeks after 1st payment depending on PO time. Crating: Included Installation: Optional at $4,000.00-$12000 extra cost depending on the location Warranty:3months after shipping Return Policy: N/A Payment …Price on request
USA
Year: 2004
All specifications and information are subject to change without notice and could not be used for purchase and facility plan. Please check the updated information at our website before purchasing. Appreciate your time. Model: Oxford 100 RIE Category: Plasma Etcher, Semiconductor Process equipment, RIE Original Equipment Manufacturer: Oxford,OXFORD Plasmalab Condition: Fully Refurbished and Tested by seller Valid Time: This item …Price on request
USA
Year: 1985
Model: Technics 2000, Technics PE-IIA Category: Plasma Asher, Semiconductor Process equipment Original Equipment Manufacturer: Technics Condition: Fully Refurbished and Tested by seller Location: U.S.A. Installation and training: Available at extra charge.Price on request
USA
Year: 1995
All specifications and information are subject to change without notice and could not be used for purchase and facility plan. Please check the updated information at our website before purchasing. Appreciate your time. Model: AST Barrel Asher Category: Plasma Asher, Semiconductor Process equipment Original Equipment Manufacturer: AST,Advanced Surface Technologies INC Condition: Fully Refurbished and Tested by seller Valid Time: This …Price on request
USA
Year:
Model: 600 SemiAuto - Semi-Automatic RF Plasma System - Can process up to 200mm wafers - Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds - Chamber Size: 245mm diameter, 380mm depth - Chamber Material: ceramic - ENI RF Generator: 0-600 Watt, 13.56 MHz - Gases: 4 channels controlled by 4 MFCs - Leybold …Price on request
USA
Year:
200mm LPCVD furnace tube 1: TEOS/anneal tube 2:Nitride/poly, gas connections: air low N2, N2, FG1, Ar, O2, SiH2Cl2(DCS), SiH4, NH3 2 Kashiyama vacuum pumps with blowers Schumacher M-Dot dopant source controller furnace dims: 66x36x78 gas module dims: 18x36x78 power req: 480v, 250amps maxPrice on request
USA
Price on request
USA
4,000 $
USA
Year:
Advanced Energy RFX600 13.56mhz RF power supply 1 ground and 1 powered shelf Leybold vacuum pumpPrice on request
USA
Year:
Dimension 3100 AFM X-Y imaging area approx. 90um square Z range approx. 6um up to 150mm sample size nanoscope IIIa controller Integrated acoustic vibration isolation tablePrice on request
USA
Year:
spin coater with GYRSET system for better uniformity and lower resin consumption Quick exchange Gyrset motorized and programmable dispense arm max 200mm wafer or 6"x6" square substrate stainless base cabinet Maximum 5000 rpm/sec acceleration motorized dispense arm multiple dispense capability for up to 2 photoresist Cybor 512 power supply with 505 controller (will control 1-2 pumps) 1 Cybor 5126C pump …Price on request
USA
Year:
208v, 3 phase, 50/60hz, 20 amps Exceptional condition: Quartz barrel shows no sign of etching or use Seren 600 watt Rf power supply 13.56mhz External wall mounted power distribution and contactor box with EFOPrice on request
USA
Year:
TAZMO SOG COATER CSX2132N Manufacturer: Tazmo Model: CSX2132N Technical Condition: Good State: Visible Description: This equipment is a through processing apparatus designed for SOG coating to baking, enabling fully automatic film formation on 150mm substrates from cassette to cassette. The system features substrate transfer performed by a two-hand robot, ensuring efficient operation. Included with the system are a standard cup, …Price on request
USA
Year:
PLC controlled and offers real-time plain English readout of system operating parameters together with remedial action in the event of an abort. Active Plasma for routine cleaning of sample surfaces RIE Plasma for aggressive cleaning of non ESD sensitive samples Downstream, Electron-Free Plasma for cleaning sensitive electronic components The Glen R3A Plasma Cleaner can be operated in a single or …Price on request
USA
Year:
ENI ACG10B 1200W Rf 13.56mhz generator 2 powered shelves Porter Masss flow controllers: 1000 SCCM N2 500 SCCM N2Price on request
USA
Year:
Vacuum chamber 340 x 400 x 450mm Door with auto unlock feature after end of process Microwave excitation 2.45GHz magnetron, maximum adjusted power 1200W 3 gas channels with Brooks MFC: N2, Ar, O2 Power req. 120/208v Pfeiffer DUO65C vacuum pump with Fomblin oil (PFPE) Pressure gauge: Baratron absolute transducer PLC process controller with RS232Price on request
USA